Valve block and container for semiconductor source reagent dispensing and/or purification

ABSTRACT

A valve block leak-tightly joinable to a receptacle to form a container suitable for liquid storage/vapor dispensing, and gas purification applications. The valve block is provided with first and second valve ports with which valves may be employed to flow feed gas through the valve block and receptacle. To effect purging the valve block ports and gas flow passages, the valve block is provided with a purge valve port wich may be opened while the first and second valve ports are closed, to remove dead space hold-up gas from the respective ports and flow passages of the block prior to initiation of vapor dispensing or gas purification operation. 
     The disclosed container is particularly advantageous for dispensing or purifying source reagent compounds for elements of Group III and Group V, in semiconductor manufacturing applications.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates generally to a valve block, which is joinable toa receptacle to form a container. Containers of such type are suitablefor storing liquid, and dispensing a vapor phase from the liquid in acarrier gas passed in contact therewith, and are also useful forcontaining a sorbent medium to effect purification of animpurity-containing gas flowed through the container.

2. Description of the Related Art

In many industrial applications, it is desirable to transfer a vaporcomponent in a carrier gas medium, the carrier gas generally being inertin the application for which the vapor is present as an activeconstituent.

An example of such application is in the manufacture of semiconductordevices, in which the vapor constituent may be a dopant, etchant, orconductive material, which is deposited on the semiconductor substrate.

In such semiconductor manufacture applications, numerous vaporconstituents are highly toxic in character, particularly those which aresource reagents for metallic components such as beryllium, cadmium,selenium, tellurium, and the like.

Accordingly, it has been common practice in the art to employ liquidstorage devices for the precursor liquids from which the vaporconstituent is derived. In operation, the vapor phase is dispensed bypassage of a carrier gas in contact with the liquid in thestorage/dispensing device, so that vapor is picked up by the carrier gasand flowed therein to the point of use in the manufacturing system.

Due to the high purities required for the vapor constituent in suchapplications, it is critical that the carrier gas and vapor constituentbe of high purity. Further, there must be no significant contaminantsintroduced into the carrier gas or the vapor constituent in thecontacting step, when the carrier gas is passed in contact with theliquid from which the vapor constituent is derived.

Similarly, due to the purity requirements for semiconductor sourcereagent gases, it is frequently necessary to purify such reagent gasesof contaminants by contacting the gases with sorbent materials selectivefor the undesired contaminants. The contacting vessels containing thesorbent materials are therefore leak-tightly constructed to avoidatmospheric or environmental contamination of the process gases, as wellas to prevent the loss of process gases from the vessel, especially whenthe same are toxic in character.

One significant problem in the operation of previously-developed liquidstorage/vapor dispensing containers and sorbent containers is the factthat they typically have "dead spaces" which are difficult to purge. Asa result, hold-up gas trapped in such dead spaces is introduced into theprocessing system, with consequent adverse effect on the downstreamoperation to which the process gases are transmitted.

More specifically, the conventional liquid storage/vapor dispensingdevice is constructed as an assembly of a cup in which the liquid isretained, and a valve block overlying and enclosing the cup. The valveblock features an inlet for introducing carrier gas into the cup, and anoutlet for discharging carrier gas containing vapor derived from theliquid in the cup. Thus, the inlet and outlet communicate with interiorpassages in the valve block, which in turn communicate with the interiorvolume of the cup.

In use, a carrier gas source, e.g., a gas cylinder, is coupled by meansof suitable valving and connectors to the inlet. The outlet is similarlycoupled by suitable valve and connecting means to flow circuitry forconveying the vapor-containing gas to ultimate end use apparatus.

In such devices, when the respective valves associated with the inletand outlet are opened, and gas is admitted to the system, the hold-upvolume of dead space gas in the valve block is displaced into the outletconduit and carried to the end use apparatus.

Since the dead space gas is typically air or atmospheric gases,significant contamination of the gas occurs, which may necessitatewasting of the hold-up gas. As indicated, the liquid may yield highlytoxic vapor constituents. This in turn may raise a significant disposalproblem for the hold-up gas, if it contains any concentration of thevapor constituent.

Alternatively, if the hold-up gas is not wasted, there may besignificant contamination of the vapor component by the hold-up gas,which will adversely affect the end use application. For example, in themanufacture of semiconductors, any minute impurity components in thedopant, source reagent, etc., may render the semiconductor devicedefective or even useless for its intended purpose.

Thus, a major problem associated with the purging of the liquidstorage/vapor dispensing device, by passage of inert or carrier gasthrough the device, is that such gas tends to contact and containsignificant quantities of the vapor component derived from the liquid inthe device. Where such vapor is highly toxic, as is the case in manysemiconductor manufacture applications, it is apparent that theresulting gas mixture produces either an undesirable disposal problemupon purging, due to the toxic constituents of the gas, or elseintroduces significant impurities to the final product manufactured fromthe vapor constituent.

Apart from the aforementioned considerations associated with dead spacesin the valve block, the liquid storage/vapor dispensing device isdesirably constructed with a minimum of joints, and external welds. Suchjoints and welds are sources of potential leakage and failure in thedevice. Furthermore, such joints and welds are not easily inspectedwhile the device is in operation, to determine whether completestructural integrity (leak-tightness) has been maintained.

Similar problems and considerations are applicable to sorbent containersin which a sorbent medium is contained in a receptacle joined to a valveblock regulating gas flows through the sorbent bed.

According, it would be a significant advance in the art to provide avalve block, suitable for application to liquid storage/vapor dispensingcontainers, or to sorbent containers, which is readily purged of thehold-up gas retained in the "dead spaces" of the inlet, outlet, andassociated passages of the valve block.

It therefore is an object of the present invention to provide a valveblock for such containers, which is readily purged of "dead space" gas.

It is another object of the invention to provide a container comprisinga valve block of such type, which is readily fabricated and simple inconstruction.

It is a further object of the invention to provide a valveblock-equipped container of the aforementioned type, having a minimumnumber of joints and seals, such as may be latently susceptible inoperation to leakage of fluid into or out of the container.

Other objects and advantages of the invention will be more fullyapparent from the ensuing disclosure and appended claims.

SUMMARY OF THE INVENTION

In one aspect, the present invention relates to a valve block,comprising:

(a) a block leak-tightly joinable at its bottom face to receptacle andhaving top, bottom, front, rear and side faces;

(b) an inlet in a first side face of said valve block for introducingfluid thereto;

(c) an outlet in a second side face of the block for discharging fluidtherefrom;

(d) a first valve port at the top face of the block;

(e) a second valve port at said top face of the block, in spacedrelationship to the first valve port;

(f) a third valve port in the front face of the block;

(g) a first fluid flow passage joining the inlet and the first valveport;

(h) a second fluid flow passage joining the first port and the bottomface of the block;

(i) a third fluid flow passage joining the first valve port and thethird valve port;

(j) a fourth fluid flow passage joining the third valve port and thesecond valve port;

(k) a fifth fluid flow passage joining the second valve port and thebottom face of the block, and in spaced relationship to the second fluidflow passage;

(l) a sixth fluid flow passage joining the second valve port and theoutlet;

the respective fluid flow passages at their junctures with therespective valve ports being positioned relative to one another wherebyindependently operable valves disposed in the valve ports and operableto provide selected open or closed valve positions establish sequentialfluid flow communication

(A) when the third valve port valve is closed and the first and secondvalve port valves are open, from the inlet through only the first fluidflow passage, first valve port, second fluid flow passage, receptacle,fifth fluid flow passage, second valve port, and sixth gas flow passage,to the outlet, and

(B) when the third valve port valve is open and the first and secondvalve port valves are closed, from the inlet through only the firstfluid flow passage, first valve port, third fluid flow passage, thirdvalve port, fourth fluid flow passage, second valve port, and sixthfluid flow passage, to the outlet.

In another aspect, the invention relates to a container comprising areceptacle leak-tightly joined at the block bottom face to a valve blockas above described. In further specific aspects, the receptacle maycontain a liquid whose vapor is dispensed into a carrier gas flowedthrough the container, or the receptacle may contain a sorbent medium topurify an impurity-containing gas flowed through the container.

In one broad method aspect, the present invention relates to a method ofdispensing a vapor phase from a contained liquid, comprising:

(a) providing a container as broadly described in the precedingparagraph, containing liquid in its receptacle, and with valves at eachof the aforementioned first, second, and third valve ports thereof,wherein all valves are in a closed position;

(b) coupling the inlet of the container to a carrier gas supply means;

(c) opening the third valve port valve while keeping the first andsecond valve port valves closed, to flow carrier gas from the supplymeans through the inlet, first fluid flow passage, first valve port,third fluid flow passage, third valve port, fourth fluid flow passage,second valve port, sixth fluid flow passage, and to the outlet, fordischarge from the container, thereby purging hold-up gas from such flowpath; and

(d) closing the third valve port valve, and opening the first and secondvalve port valves, to flow carrier gas from the supply means through theinlet, first fluid flow passage, first valve port, second fluid flowpassage, receptacle, fifth fluid flow passage, second valve port, sixthfluid flow passage, and to the outlet, for discharge of vapor-containingcarrier gas from the container.

In another method aspect, the present invention relates to a method ofpurifying a gas of impurities, comprising:

(a) providing a container as broadly described in the precedingparagraph, containing in its receptacle a sorbent selective for theaforementioned impurities, and with valves at each of the aforementionedfirst, second, and third valve ports thereof, wherein all valves are ina closed position;

(b) coupling the inlet of the container to a purge gas supply means;

(c) opening the third valve port valve while keeping the first andsecond valve port valves closed, to flow gas from the purge gas supplymeans through the inlet, first fluid flow passage, first valve port,third fluid flow passage, third valve port, fourth fluid flow passage,second valve port, sixth fluid flow passage, and to the outlet, fordischarge from the container, thereby purging hold-up gas from such flowpath; and

(d) closing the third valve port valve;

(e) uncoupling the inlet of said container from the purge gas supplymeans;

(f) coupling the inlet of the container to a source of theimpurity-containing gas; and

(g) opening the first and second valve port valves, to flowimpurity-containing gas from the supply means through the inlet, firstfluid flow passage, first valve port, second fluid flow passage,receptacle, fifth fluid flow passage, second valve port, sixth fluidflow passage, and to the outlet, for discharge of impurity-depleted gasfrom the container.

Other features and elements of the invention will be more fullyappreciated from the ensuing disclosure and appended claims hereof.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is an elevation view of a liquid storage/vapor dispensingcontainer, utilizing a valve block according to one embodiment of theinvention.

FIG. 2 is a liquid storage/vapor dispensing container of the generaltype shown in FIG. 1, in which the receptacle and lower portion of thevalve block are shown in sectional view to illustrate the operationalfeatures thereof.

FIG. 3 is a sectional elevation view of a lower portion of liquidstorage/vapor dispensing container according to another embodiment ofthe invention, also of the general type shown in FIG. 1.

FIG. 4 is a still further embodiment of a liquid storage/vapordispensing container of the general type shown in FIG. 1, and having thelower portion of the valve block and the receptacle shown in sectionalview, to illustrate the elements and operational features thereof.

FIG. 5 is a side elevational view in partial section, of a container ofthe general type shown in FIG. 4, but with the provision of a liquidloading port.

FIG. 6 is a top plan view of a valve block according to one embodimentof the invention, shown in partial break-away view, to illustrate theoperation of the purge valve port and associated diaphragm valveelement.

FIG. 7 is sectional elevation view, along line A--A, of the valve blockof FIG. 6, in which diaphragm valves are depicted in the first andsecond valve ports, in fluid communication with the bottom face of thevalve block.

FIG. 8 is a bottom plan view of the valve block of FIGS. 6 and 7,showing the second and fifth gas flow passages at the bottom face of thevalve block.

FIG. 9 is an elevation view of a gas purifier container according to oneembodiment of the invention, shown in partial sectional view at itsreceptacle portion.

DETAILED DESCRIPTION OF THE INVENTION, AND PREFERRED EMBODIMENTS THEREOF

The valve block of the present invention may be usefully joined, in aleak-tight manner, to receptacles of various specific types, to formcontainers which are advantageously employed to hold liquids for vapordispensing, or to contain sorbents for fluid purification.

In the case of vapor dispensing, a carrier gas is flowed via the valveblock into the container receptacle for contacting with the liquidtherein. By such contacting, the vapor phase of the liquid is introducedinto the carrier gas, which then flows from the receptacle and throughthe valve block to the container outlet.

In gas purification applications, a sorbent material is disposed in thecontainer receptacle, and the impurity-containing fluid is flowed viathe valve block into the receptacle for contacting with the sorbent toremove impurity therefrom. The resulting impurity-depleted fluid flowsthrough the valve block to the container outlet.

The liquid storage/vapor dispensing container embodiment of theinvention is adapted for the storage, transport and delivery ofmaterials such as ultra-high purity reagents. Such storage/dispensingcontainers, wherein a vapor phase of a liquid is dispensed in a carriergas which has been passed in contact with the liquid, find utility inapplication areas such as electronics, aerospace, and defense.

The liquids with which the vapor dispensing container of the presentinvention may be employed include any suitable liquids capable ofyielding a vapor phase to a carrier gas with which the liquid iscontacted. Examples of such liquids include those which are sourcecompounds for elements selected from the group consisting of Group IIIand Group V elements, such as polyalkyl compounds of such type.Illustrative of such suitable polyalkyl compounds are trimethylaluminum, trimethyl gallium, dimethyl beryllium, dimethyl selenium,dimethyl tellurium, and dimethyl cadmium.

It will be appreciated that the foregoing listing of polyalkyl compoundsis illustrative in character only, and that various other polyalkylcompounds, as well as numerous other liquid materials of various types,may be disposed in the storage portion of the device, to provide thecorresponding vapor component when a suitable carrier gas is passed incontact with the liquid.

It will also be appreciated that the utility of the vapor dispensingembodiment of the invention is not strictly limited to liquids, but maybe used in connection with the storage of solid materials havingsufficient vapor pressure to produce a vapor phase constituent of acarrier gas, when the later is passed in contact with the solid.Accordingly, the term "liquid" as used in this context is intended to bebroadly construed to include not only liquids but, where applicable,solids meeting the foregoing criterion as well.

It will further be appreciated that instead of directly contacting thecarrier gas with the liquid, to provide vapor from the liquid in theeffluent carrier gas, it may in some instances suffice to simply contactthe carrier gas with a pre-existing vapor phase of the liquid, e.g., thevapor overlying a liquid volume in the storage/dispensing device.Accordingly, the phrase "passed in contact with the liquid" will beunderstood as broadly including the contacting of the carrier gas withthe liquid itself, the contacting of the carrier gas with the vaporphase of such liquid, or both the liquid and vapor phases of the liquid.

Referring now to the drawings, FIG. 1 shows an elevation view of aliquid storage/vapor dispensing container according to one embodiment ofthe invention. The container 10 comprises a receptacle 12 for containingliquid, the vapor phase of which is to be dispensed. The receptacle thusmay have a cup-like configuration with an open upper end. Preferably thereceptacle is integrally formed as a single piece article, to eliminatethe presence of joints, seams, and seals, except at its uppermost end,where it is leak-tightly joined to the valve block 14, e.g., by thecircumferentially extending weld 16, or by other joining or bondingmeans whereby satisfactory leak-tightness is assured for the containercomprising the receptacle and valve block elements as joined to eachother.

The receptacle and valve block elements may be formed of any suitablematerial providing requisite leak-tightness, i.e., near-zeropermeability, and the appropriate weight, forming, appearance, andjoining characteristics for the intended use application. In the broadpractice of the invention, valve block and receptacle elements ofstainless steel, e.g., 304 stainless steel, have been used to goodadvantage.

The valve block 14 of receptacle 10 features an inlet 18, to which hasbeen joined a connector conduit 20 and coupling 22, for joining theinlet in gas flow communication with a suitable source of a carrier gassuch as nitrogen, helium, krypton, argon, hydrogen etc., as suppliedfrom the schematically illustrated carrier gas feed line 24, which isjoined to a suitable source of carrier gas such as a pressurized tank orother supply means (not shown).

From such feed line, coupling conduit, and inlet, the carrier gas isflowed through passages in the valve block 14, as hereinafter more fullydescribed, and passed into the receptacle 12 for contacting with theliquid therein. The vapor-containing carrier gas resulting from suchcontacting then is flowed from the receptacle through other passages inthe valve block, as also hereinafter more fully described, to outlet 26,which is at a face of the valve block 14 opposite the face provided withinlet 18.

From the outlet, the vapor-containing carrier gas is flowed throughconnecting conduit 28 and coupling 30 to discharge line 32, for transferof the vapor-containing carrier gas to a suitable downstream end-useapparatus or process system (not shown).

On the top face 34 of the valve block 14 are disposed laterallyspaced-apart flow valves 36 and 38. Valves 36 and 38 are independentlyoperable, being disposed in separate valve ports of the block, ashereinafter more fully described, with the valves being operable toprovide selected open or closed valve positions, for normal gas flowoperation, and purge gas flow, depending on the respective open orclosed valve positions.

Correspondingly, valve 40 is disposed on the front face 42 of the valveblock 14. Valve 40 is likewise selectively operable to provide an openor closed valve position, depending on the normal gas flow, or purge gasflow, mode of operation. Valve 40 thus is disposed in a correspondingvalve port of the block.

FIG. 2 is a partially sectioned elevation view of a liquid storage/vapordispensing container of the general type shown in FIG. 1, but having thecoupling means associated with the inlet and outlet, 18 and 26,respectively, omitted for clarity. All other corresponding elementsshown in FIG. 1 are correspondingly numbered in FIG. 2.

In this embodiment, the receptacle 12 contains a volume of liquid 14,e.g., an organometallic compound of liquid form, a vapor phase of whichis to be dispensed into the carrier gas, such as for semiconductormanufacturer.

The lower portion of the valve block 14 is broken away to show theinterior passages at such lower portion, comprising a second gas flowpassage 44, and fifth gas flow passage 46, the terms "second" and"fifth" referring to the numbering of respective gas flow passages inthe block, as described hereafter.

During the normal gas flow operation of the container shown in FIG. 2,carrier feed gas is introduced from feed line 24 into the valve block 14and through flow passages and ports hereafter described, flowing then tothe second gas flow passage 44 which extends to, and terminates at, thebottom face 48 of the block. Joined to the second gas flow passage 44 atthe lower face 48 of the block is a dip tube 50, which extendsdownwardly from the bottom face of the block into the lower portion ofthe receptacle 12.

At the lower end of the dip tube there is provided a flow restrictiondevice 52, which may suitably be constructed of sintered metal,superposed layers of screen, ceramic media, or the like. The preferredform of the flow restriction device is a sintered metal plug, e.g.,formed of stainless steel, provided at the opening at the lower end ofthe dip tube. The purpose of such flow restriction device is to effectthe generation of finely divided bubbles from the gas passed from secondgas flow passage 44 into dip tube 50, whereby a high extent of masstransfer surface is generated per unit volume of gas introduced into theliquid 14.

The dispersion of the carrier gas into the liquid 14 in the form ofbubbles 54 permits the carrier gas to efficiently receive vapor from theliquid, which then is augmented by vapor from the overhead gas space 56in the receptacle, as the carrier gas passes through the receptacle intofifth gas flow passage 46 for discharge from the container, in outlet 26and discharge line 32.

The inlet of the fifth gas flow passage 46 at the bottom face 48 of thevalve block may likewise be provided with a suitable flow restrictiondevice similar in character to device 52, to restrict entrainment ofliquid in the vapor-containing carrier gas entering the fifth gas flowpassage.

FIG. 3 shows a liquid storage/vapor dispensing container according toanother embodiment of the invention. All system elements in FIG. 3 arenumbered correspondingly with respect to the same elements in FIGS. 1and 2, by addition of 100 to the reference numerals for thecorresponding FIGS. 1-2 elements.

The container shown in FIG. 3 differs from that of FIG. 2, in theprovision of a shortened dip tube 160 joined to the second gas flowpassage 144 in the valve block 114. The function of this dip tube is tochannel the influent carrier gas into the receptacle and thereby preventshort-circuiting or bypassing behavior, i.e., passage of carrier gasfrom the opening of passage 144 directly to the opening of fifth gasflow passage 146.

Disposed in the interior of receptacle 12 is a liquid enclosure 162formed of a semipermeable material, which is vapor permeable and liquidretentive in character. The semipermeable material may be any suitablematerial meeting the criteria of permitting vapor from the liquid 164 todiffuse outwardly from the enclosure through the permeable wallsthereof, while retaining liquid in the enclosure. Illustrative materialsof construction for the liquid enclosure may include porous ceramics,sintered materials, polymeric materials such as Teflon® fluorocarbonpolymer, and other suitable natural and synthetic membrane materials.

In this embodiment, influent carrier gas from second gas flow passage144 is channeled through the dip tube 160 and into contact with thereceptacle, and the vapor in the gas space 166 surrounding the upper endof enclosure 162. The influent carrier gas in this embodiment thus isnot directly contacted with the liquid, since the liquid is retained inenclosure 162.

By virtue of the vapor-permeable, liquid-retentive enclosure in thereceptacle, the embodiment of FIG. 3 is unaffected by being tipped overor positioned sideways, with respect to the upright position of thecontainer shown in the FIG. 2 embodiment. Accordingly, there is highresistance to liquid leakage and/or entrainment, and the device may beshipped, stored, or otherwise positioned in the use system, withoutregard to the orientation or attitude of the device, whereas the deviceshown in FIG. 2 must be stored, transported, and positioned in theend-use apparatus in an upright position as shown, to avoid leakage ofliquid into the gas flow passages of the device, and/or the occurance ofliquid entrainment in the use of the container.

FIG. 4 shows another embodiment of the invention, in which systemelements are numbered correspondingly to FIG. 1, by addition of 200 tothe reference numerials for the corresponding FIG. 1 elements. In thisembodiment, however, the valves on the top surface 234 of the valveblock 214 have been omitted, as has the purge valve mounted at the frontface 242 of the valve block. The omission of the purge valve, forreasons of clarity, shows the details of the associated purge port 270,hereinafter referred to as the third valve port. The two valve ports onthe top face 234 of the valve block, omitted in FIG. 4 for clarity, aredenoted the first and second valve ports, respectively, and are morefully described hereinafter.

The valve port 270 is generally of cylindrical shape with a circularcross-section, and is formed as a bore in the valve block 214. The sidewall surfaces 272 of such bore may have a "stepped-down" configuration,or may be threaded or otherwise provided with a structure accomodatingthe insertion of a suitable valve, such as first valve 36, second valve38, and third valve 40 shown in FIG. 1.

The cylindrical bore forming the port terminates at its lower end in agenerally planar floor 274 of the port. At such floor, the port joinsgas flow passage 276, hereinafter referred to as the fourth gas flowpassage, and gas flow passage 278, hereinafter referred to as the thirdgas flow passage. The valve block has an inlet 218 joined to connectingtube 220, and coupling means 222. In like manner, the outlet 226 of thevalve block is joined to connecting conduit 228 and coupling means 230,which are in turn connected to discharge line 232.

The valve block 214 is joined to receptacle 212 by means of thecircumferentially extending weld 216.

In the lower portion of the valve block 214, second gas flow passage 244extends downwardly to the bottom face 248 of the valve block, where itis joined, as by welding, bonding, or other suitable joining means, tocoil 280. The coil provides an extended flow path for channeling theinfluent carrier gas to the lower portion of receptacle 212, where it isdischarged and flowed in contact with liquid filled tubes 282. Tubes 282are constructed of a suitable material such as those illustrativelydescribed in connection with enclosure 162 in FIG. 3. They are filledwith liquid whose vapor phase is to be dispensed from the container, andare permeable to such vapor. The contained liquid thus may be arsine,phosphene, organometallics, etc., as desired for the selected end-useapplication. Liquid-filled permeation tubes of such type arecommercially available as TraceSource™ Precision Gas StandardsGenerators, from Kin-Tek Laboratories, Texas City, Tex. After contactingwith the vapor of the contained liquid, the resulting vapor-containingcarrier gas is discharged from the receptacle 212 in fifth gas flowpassage 246, for ultimate discharge at the outlet in discharge line 232.

FIG. 5 shows a partially sectioned elevation view of the FIG. 4 liquidstorage/vapor dispensing container, which has been modified by theprovision of a loading port for introduction of liquid into thereceptacle 212. The loading port 284 comprises a loading passage 286extending through the valve block 214 from the top face 234 to thebottom face 248 thereof. Leak-tightly mounted in the loading passage isa loading tube 288 which extends above the valve block 214, through theloading passage 286 and downwardly below the valve block 214 into thereceptacle's upper portion, as shown. The loading tube 288 is suitablyprovided with a closure means 290 which is manually selectivelyadjustable to open the loading tube, or close same, to communicationwith the interior of receptacle 212, as desired.

By means of the loading port, the liquid-filled permeation tubes 282 maybe introduced to the receptacle 212 after the receptacle has been weldedto the valve block 214. It is also possible to provide the loading portwith adequate dimensions and configuration to effect removal of theliquid source tubes 282, after the same have been exhausted followingextended operation. In such event, the loading tube 288 may be removedfrom the loading passage 286 and the container suitably inverted, andshaken or moved as required, to effect removal of the liquid sourcetubes through the loading passage. For this reason, the loading passagemay be provided with a flared interior portion, as shown.

It will be recognized that a similar loading port configuration may beemployed in conjunction with containers of the type shown in FIG. 2,whereby liquid is flowed through the loading port into the receptacle,or removed from the receptacle through such port, as desired.

As an illustration of the dimensional characteristics and features of acommercial embodiment of the present invention, of the type generallyshown and described with reference to FIGS. 4 and 5, the receptacle maybe 2 inches in outer diameter, with a 0.065 inch wide thickness, 6.5inches in height, and formed of 316L stainless steel. The total heightof the container, comprising the receptacle and valve block weldedthereto, is on the order of 8 inches. The coiled passage 280 may also beformed of stainless steel, with an outer diameter of approximately 0.25inch, and a wall thickness of 0.60 inch. The liquid-filled permeationtubes 282 may have an outer diameter on the order of about 1/8 inch, anda length of 2 inches. The valve block 214 in such embodiment has agenerally square top face 234 whose side dimensions are approximately2.75 inches. The valve block may also be formed of stainless steel, andis approximately 1.5 inches in height. The couplings 222, 230 and 290may suitably comprise VCR® couplings (Crawford Fitting Company, Solon,Ohio).

FIGS. 6-8 show respective top plan, sectional elevation, and bottom planviews of a valve block of a type employed in the embodiments of FIGS.1-5.

All elements in FIGS. 6-8 are numbered correspondingly with respect tothe FIG. 4 embodiment, by addition of 100 to the reference numerials forthe corresponding FIG. 4 elements.

Referring now to FIG. 6, there is shown a top plan view of valve block314. The top face 334 of this valve block is planar, as are the mainface portions of front face 242, rear face 292, and side faces 294 and296. Inlet 318 is provided at side face 394, and outlet 326 is providedat side face 396.

A first valve port 301 is provided in the valve block at the top facethereof, as a bore of generally cylindrical configuration extendingdownwardly into the block and terminating at the planar floor 303 of theport. In spaced relationship to the first port 301 is a second port 305,which is similarly constructed with a generally cylindrical boreconfiguration terminating at its lower extent in the planar floor 307.The sidewalls of the respective bores forming these ports may beconstructed with a stepped-down or threaded configuration, as previouslydescribed, whereby the ports accommodate the insertion and coupling ofsuitable valves.

At the front face 342 of the valve block is a third port 370, also ofgenerally cylindrical configuration, and terminating at its inner extentat planar floor 374. The sidewall 372 of third port 370 may be similarlystepped-down or threaded to accommodate the insertion and coupling of avalve with such port.

The first port 301, at its floor 303, is connected by first gas flowpassage 309 with inlet 318. This port likewise is connected at its floorto second gas flow passage 344, extending from the port floor to thebottom face of the valve block, as shown in the bottom plan view of theblock in FIG. 8. The first port 301 is also connected at its floor withthird gas flow passage 311, joining the first port with the third port370.

In spaced relation to the third gas flow passage 311, at the floor ofthird port 370, is fourth gas flow passage 313, joining the third portwith the second port 305. The fourth gas flow passage 313 terminates atthe floor 307 of the second port 305, in spaced relationship to fifthgas flow passage 346 which extends from such port floor to the lowerface 348 of the valve block, as best shown in the bottom plan view ofFIG. 8.

In further spaced relationship to the fourth and fifth gas flowpassages, is sixth gas flow passage 315, joining the second valve port305 with outlet 326.

Preferably, as shown, the second and fifth gas flow passages arecentrally disposed at their respective junctures with the cylindricalports 301 and 305.

Such preferred arrangement includes the termini of the respective firstand third gas flow passages being disposed in spaced relationship to theterminus of the second gas flow passage at the floor of the first port,with the first and third gas flow passages being joined to the firstport at outer portions of the first port floor.

The second port 305 is similarly constructed with the respective fourthand sixth gas flow passages being joined to the port at peripheralportions of the port floor 307, in spaced relationship to the centrallydisposed terminus of the fifth gas flow passage 346.

The features of the respective first and second ports and the associatedgas flow passages are more fully apparent with reference to FIG. 7,which is a sectional elevational view of the FIG. 6 valve block takenalong line A--A, and wherein all reference numbers are the same as inFIGS. 6 and 8.

As shown in FIGS. 1 and 2, each of the first, second, and third valveports is suitably provided with a valve, each of which is independentlyoperable to provide selected open or closed valve positions. For ease ofdescription in FIGS. 6 and 7, diaphragm valve elements 321, 323, and 325have been shown as disposed in the first, second, and third valve ports,respectively, with the associated valve body, stem, and associatedstructure deleted for clarity.

As shown in FIGS. 6-7, each of the respective valve diaphragm elements321, 323 and 325 are adjustable between open and closed positions. Theclosed position is shown in FIG. 7 for diaphragm elements 321 and 323 infirst and second valve ports 301 and 305, respectively, with thecorresponding open positions for these diaphragm elements being shown indotted line representation.

Correspondingly, the diaphragm element 325 in third valve port 370 isshown in open position, with the corresponding closed position shown indotted line representation.

By means of conventional associated structure, the diaphragm valveelements may be readily manually adjusted, or automatically adjusted ifdesired, to assume the open or closed positions described above.

Although diaphragm valves are preferred for simplicity and ease ofoperation, it is contemplated that any other suitable valve types may beemployed in the broad practice of the present invention, as appropriateor desirable to effect the requisite gas flows through the respectivegas flow passages and ports in the valve block, as hereinafterdescribed.

When the container of the invention is appropriately coupled at itsinlet with a source of suitable carrier gas, and at its outlet with asuitable discharge conduit or other flow means for conveying thevapor-containing carrier gas to the desired use environment, withassociated valves disposed in the various valve ports, it will beapparent that there will be "dead space" hold-up gas in the respectivevalve ports and gas flow passages of the valve block.

By opening the purge valve at third valve port 370, so that, when adiaphragm valve is employed, its diaphragm element has the positionshown in FIG. 6, while at the same time closing the valves associatedwith the first and second valve ports, so that, when diaphragm valvesare employed, the diaphragm elements assume the positions shown in solidline representation in FIG. 7, the flow of feed gas takes place to purgethe respective gas flow passages and valve ports.

Specifically, with the valves in the previously described positions,feed gas entering the valve block in inlet 318 flows in the serial flownetwork (hereinafter termed the "purge loop"), comprising inlet 318,first gas flow passage 309, valve port 301 (in the peripheral volumedefined between the closed diaphragm element 321, floor 303, and portsidewall portions associated therewith, third gas flow passage 311,third valve port 370, fourth gas flow passage 313, second valve port305, sixth gas flow passage 315 and outlet 326. The purge loop thus isclosed to gas flow communication with the receptacle, by closure ofdiaphragm valve elements 321 and 323 against the second gas flow passage344 and fifth gas flow passage 346, respectively.

After purging has taken place to remove the dead spaced hold-up gas fromthe gas flow passages and ports of the valve block, as necessary toavoid subsequent contamination of the process gas stream, i.e., thevapor-containing carrier gas discharged from the container in subsequentonstream operation, the active dispensing operation then is commenced asdescribed below.

First, the purge loop is deactivated by closure of the purge valve atthe third valve port, so that, when a diaphragm valve element isemployed as shown in FIG. 6, such element assumes the position shown indotted line representation in this drawing. By closure of the purgevalve, the associated valve element blocks fourth gas flow passage 313against flow through the purge port from the third gas flow passage 311,as occurs in the purging operation.

With the purge loop thus closed to flow, the valves associated with thefirst valve port 301 and second valve port 305 are opened, so that whendiaphragm valves are employed at such ports, utilizing the diaphragmvalve elements shown in FIG. 7, such elements assume the position shownin dotted line representation in that drawing.

By such action, there is created a second serial flow network ("normalflow loop"), comprising inlet 318, first gas flow passage 309, port 301,second gas flow passage 344, the receptacle (not shown in FIG. 7 forclarity) wherein the carrier gas is contacted with liquid to yield avapor-containing carrier gas, fifth gas flow passage 346, second port305, sixth gas flow passage 315, and outlet 326.

For the previously described commercial embodiment of FIG. 4, comprisinga container of 8 inch height, and a receptacle of 6.5 inches height and2 inches outer diameter, a valve block as shown in FIGS. 6-8 may beemployed, having a height of approximately 1.5 inches, and a sidedimension of approximately 2.75 inches, the planar face portion of whichhas a length of 1.66 inches. The corners of the block in plan view arerounded off, as shown in FIGS. 6 and 8. In this valve block, thediagonal distance between opposite rounded corners of the valve block oneach top and bottom faces, is 3.0 inches. The first, second, and thirdvalve ports in the valve block are, as indicated, of cylindricalconfiguration, as formed by counter-boring the valve block in eachinstance to a depth of 0.29 inches, the diameter of each suchcylindrical bore being 1.03 inch. The valves which are disposed in therespective valve ports of the block in this commerical embodiment aremodified SPD™ diaphragm valves (Carter Systems, Inc., Middlebury,Conn.).

In some instances, it may desirable to coat the interior surfaces of thegas flow passages in the valve block, and optionally the valve portsurfaces, with a protective coating, such as an inert and/or lowfriction coefficient material. Although any suitable material may beused for such purpose, preferred materials include fluorocarbonpolymers, such as polytetrafluoroethylene. In applications where thecontained liquid and/or carrier gas is corrosive in character, thereceptacle and valve block of the container preferably are formed of acorrsion-resistant material, such as stainless steel.

The carrier gases with which the container of the present invention maybe employed include any suitable gaseous material which is able toobtain sufficient vapor in its contacting with the liquid, e.g., bypassage through the receptacle, to provide utility in the end-use forwhich the vapor-containing gas is intended.

For applications such as semiconductor manufacturing, it is generallynecessary that the carrier gas be of high purity and inert in theend-use environment, so that no impurities or extraneous constituentsare incorporated in the semiconductor device being produced. For suchsemiconductor manufacturing applications, the carrier gas may be a gassuch as nitrogen, helium, hydrogen, argon, and the like, with heliumbeing a preferred inert carrier gas.

The container of the invention may suitably be prepared as a discretepackaged article of commerce, in which the respective inlet and outlet,and the purge valve ports are closed with suitable closure means. Thevalve ports may be equipped with installed valves or other closuremembers, e.g., externally threaded pipe caps, and liquid may be packagedin the receptacle.

Such closed container, having liquid therein, may be readily storedand/or transported, and subsequently introduced into a use systemwherein valves are appropriately installed, if not already present, andappropriate couplings are effected with the inlet and outlet, to jointhe device with a suitable flow circuit for purging and subsequent vapordispensing operation.

The installed device may then be purged in the manner previouslydescribed, to rid the system of hold-up dead space gas in the inlet andoutlet, and the respective valve ports and gas flow passages.

In applications such as semiconductor manufacture, wherein the liquidcontained in the previously described illustrative commercial embodimentmay be a polyalkyl source reagent such as trimethyl gallium, the flowpassages may be appropriately sized to accomodate a flow rate of carriergas through the system on the order of from about 20 milliliters perminute to about 4 liters per minute. Such flow rates typically provide aconcentration of vapor in the carrier gas, at the outlet of thecontainer, of from about 1 to about 20 millibars partial pressure, at aline pressure on the order of from about 10 to 20 psi. The foregoingrange of flow rates is representative of normal operation, it beingappreciated that higher flow rates may be necessary or desirable in thepurging step prior to commencement of normal vapor-dispensing operation.

While the utility of the liquid storage/vapor dispensing containerembodiment of the invention has been primarily described in terms ofdispensing of vapor derived from reagent source liquids forsemiconductor manufacture operations, it will be apparent that theutility of the invention is not so limited, and that such utilityextends to any other applications in which a carrier gas is passed incontact with a liquid as broadly defined herein, to provide a vapor ofthe liquid in the contacted carrier gas.

The container of the invention may also be employed for any other ofnumerous operations involving vapor dispensing, such as where a carrierfluid introduced into the receptacle is at elevated temperature andcontacts a solid material in the container, to effect sublimation orvaporization thereof, to generate the vapor phase which then isdispensed in the carrier fluid.

In another embodiment, the receptacle of a container according to thepresent invention may be filled with a solid bed of scavenger material,which is sorptively selective for one or more components of amulticomponent gas mixture. Flow of the gas mixture through the valveblock and receptacle will then result in sorption of the selectedcomponent(s), to yield a selected component(s)-depleted gas, which isthen discharged from the receptacle through the valve block to theoutlet of the container.

Such a gas purification vessel is shown in FIG. 9, wherein the apparatuselements are numbered correspondingly to FIG. 1, by addition of 400 tothe reference numerals of the corresponding FIG. 1 elements.

As shown in FIG. 9, container 410 comprises valve block 414 leak-tightlyjoined to receptacle 412 by circumferentially extending weld 416.Disposed in the receptacle in a bed 417 of a suitable sorbent materialwhich is selective for undesired component(s) of the gas to be purifiedby passage through the container.

The bed of sorbent material may comprise granules, pellets, or particlesof a solid active sorbent, or an active sorbent supported on a suitablematrix medium. The sorbent may also be in the form of a gel, semisolid,or in any other suitable form, and may effect removal of impurities fromthe treated gas by any suitable mechanism, such as physical adsorption,absorption, chemisorption, chelation, etc. Generally, particulate solidor particulate matrix-supported chemisorbants are preferred as thesorbent material, preferably those yielding non-volatile or otherwisenon-deleterious chemisorption reaction products.

The valve block 414 of container 410 features an inlet 418, to which hasbeen joined a connector conduit 420 and coupling 422, for joining theinlet in gas flow communication with a suitable source ofimpurity-containing feed gas, such as impurity-containing arsine,phosphine, ammonia, hydrogen bromide, hydrogen chloride, etc., assupplied from the schematically illustrated feed gas line 424, which isjoined to a suitable source of feed gas (not shown).

From the feed line, coupling conduit, and inlet, the impurity-containingfeed gas is flowed through passages in the valve block 414, aspreviously described with reference to FIGS. 6-8 herein, and passed intothe receptacle 412 for contacting with the sorbent material therein. Theimpurity-depleted gas resulting from such contacting then is flowed fromthe receptacle through other passages in the valve block, as alsopreviously described with reference to FIGS. 6-8 herein, to the outlet426 at the face of the valve block 414 opposite the face provided withinlet 418.

From the outlet, the purified gas is flowed through connecting conduit428, coupling 430, filter 401, and coupling 403 to discharge line 432,for transfer of the purified gas to a suitable downstream end-useapparatus or process system (not shown).

The valve block 414 is constructed correspondingly topreviously-described embodments and features laterally spaced-apart flowvalves 436 and 438 on the top face 434 of the block. Valves 436 and 438are independently operable, being disposed in separate valve ports ofthe block, to provide selected open or closed valve positions, toaccomodate normal gas flow operation, and purge gas flow, depending onthe respective open or closed valve positions.

Valve 440, disposed in a valve port at the front face 442 of the valveblock, is likewise selectively operable to provide an open or closedvalve position, depending on the normal gas flow, or purge gas flow,mode of operation.

The receptacle 412 in this gas purification container embodiment ispartially broken away to show the dip tube 405 extending downwardly fromthe second gas flow passage in the valve block into a lower portion ofthe sorbent bed 417, the dip tube being joined to the second gas flowpassage by welding or other suitable joining means at the bottom face ofthe valve block. At its lower end, the dip tube is joined to a sinteredmetal filter 407, the purpose of which is to contain the bed, and toprevent fines from being carried in the purified product gas ultimatelydischarged from the container.

Joined to the fifth gas flow passage of the valve block at its bottomface is a short spacer tube 409, to the lower end of which in turn isjoined a sintered metal filter 411. This filter serves to contain thesorbent bed and restricts entrainment of particulate solids in theimpurity-depleted product gas flowed through spacer tube 409 to thefifth gas flow passage of the block, for ultimate discharge from thecontainer system in effluent line 432.

At the lower end of receptacle 412 is provided a sorbent passage 413 andfill port 415, for introducing fresh sorbent material into thereceptacle and removing spent sorbent material therefrom, whereby thegas purification container may be reused after an initial charge ofsorbent material has become exhausted after an extended period ofoperation.

In gas purification operation, the FIG. 9 container may be arranged sothat the feed gas line 424 is selectively switchable to a source ofpurge gas, e.g., argon, helium, nitrogen, hydrogen, etc., oralternatively to a source of the impurity-containing gas to be purified.All valves, including normal flow valves 436 and 438, and purge valve440, are initially closed.

The container inlet then is coupled to the purge gas supply means. Thepurge valve 440 is opened, to flow purge gas from the purge gas supplymeans through the first fluid flow passage, first valve port, thirdfluid flow passage, third valve port, fourth fluid flow passage, secondvalve port, sixth fluid flow passage, and outlet, of the valve block,with discharging of purge gas from the outlet 426 and final dischargefrom the system in line 432.

The purge valve then is closed, and the inlet of the container isuncoupled (switched) from the purge gas supply means, followed bycoupling the inlet of the container to a source of theimpurity-containing gas, as introduced in feed line 424.

Next the first and second valve port valves, valves 436 and 438, areopened, to flow the impurity-containing gas from the supply meansthrough the inlet, first fluid flow passage, first valve port, secondfluid flow passage, the receptacle, the fifth fluid flow passage, secondvalve port, sixth fluid flow passage, and outlet of the container, forflow of impurity-depleted gas from the outlet 426 to discharge line 432.

The sorbent material utilized in the receptacle of the gas purificationcontainer embodiment of the invention may be varied widely depending onthe composition of the gas which it is desired to purify. For thepurification of gases such as arsine, phosphine, ammonia, and inertgases, to remove Lewis acid and oxidant impurities therefrom, suitablesorbent materials may include the scavengers disclosed in our copendingU.S. application Ser. No. 029,632, filed Mar. 24, 1987, herebyincorporated by reference herein. As another example, for drying ofhydrogen halide gases to remove water impurity therefrom, the waterscavengers disclosed in our copending U.S. application Ser. No. 029,631,filed Mar. 24, 1987, and hereby incorporated by reference herein, may beadvantageously employed. Other scavenger materials for the removal ofLewis acid and oxidant impurities from inert fluids are disclosed inU.S. Pat. No. 4,603,148 to G. N. Tom, as potentially useful in the broadpractice of the present invention.

Referring again to FIG. 9 as previously described, a commercial gaspurification container embodiment of the invention may utilize a valveblock 414 having the dimensional characteristics and constructionpreviously described in the illustrative commerical embodiment of theliquid storage/vapor dispensing embodiment of the invention. For suchvalve block, the receptacle 412 of the purification container may havean outer diameter of approximately 2 inches and a length which may rangefrom about 6 to about 24 inches, depending on the type of scavenger andthe capacity required. The receptacle may be formed of a stainlesssteel, with a wall thickness of 0.065 inch. With such dimensions, thesorbent material capacity of the receptacle may range from on the orderof 300 milliliters up to about 1 liter, and typically the receptaclewill be substantially completely filled with the sorbent material.

In this illustrative gas purification container embodiment, thecouplings 422, 430 and 403 may be 0.25 inch male VCR® blank fittings.The fill port 415 may correspondingly be a 0.5 inch VCR® fitting. Thefilter 401 is suitably a Millipore Wafergard® 0.05 micron filter(Millipore Corporation). The sintered metal filters 407 and 411 may eachbe formed of stainless steel with a length of 1 inch and diameter of0.25 inch, with an average pore size in the range of from about 15 toabout 40 microns. These filters serve a bed containment function, andprevent particulates from being passed through the container to theproduct gas stream as discharged in line 432, in conjunction with thefines filter 401.

Dip tube 405 in this illustrated embodiment may have an outer diameterof 0.25 inch, with a wall thickness of 0.065 inch, its length being suchthat, together with the associated filter 407, the lower end of suchfilter is approximately 1/8 inch above the floor of the receptacle 412.The spacer tube 409 may have similar outer diameter and wall thicknessdimensions, and a length on the order of about 3/8 inch. The fill tube413 may have an inner diameter of 0.41 inch, an outer diameter of 0.6inch, and a length on the order of 1 inch.

The gas purification container as described above preferably is filledwith sorbent material under an inert gas atmosphere, after thereceptacle has first been purged with inert gas. After the receptaclehas been fully filled with sorbent material, the container is sealed byclosure of the fill port 415.

As an example of the use of the illustratively described purificationcontainer embodiment of the invention, a container of such type,containing in its receptacle a preconditioned arsine scavenger of thetype disclosed in our aforementioned copending U.S. application Ser. No.029,632, as a sorbent bed of 0.3 liter volume, is able to readily reducewater and oxygen impurities in arsine from levels on the order of 40parts per million by volume to less than 10 parts per billion by volume.One liter of such scavenger may have an oxygen removal capacity of 1liter and a gaseous water removal capacity on the order of 2 liters.Thus, a 0.3 liter sorbent bed may be used to treat 15,000 liters ofarsine having 20 parts per million by volume water impurity.

Thus, in operation, the normal flow loop and purge flow loop operationof the gas purification container of FIG. 9 is analogous to thatpreviously described in connection with FIGS. 6-8 for the liquidstorage/vapor dispensing container embodiment of the invention.

The triple valve configuration of the valve block of the inventionpermits dead space gases to be readily purged from the system via theintegral purge by-pass loop. With the purge (by-pass) valve closed, thevalves at the top face of the valve block (e.g., valves 436 and 438 inFIG. 9) provide convenient on-off service for the container in thepurification system.

Although the invention has been shown with reference to specificdetailed embodiments, it will be apparent that numerous modifications,variations, and other embodiments are possible, and accordingly, allsuch modifications, variations, and embodiments are to be regarded asbeing within the spirit and scope of the invention.

What is claimed is:
 1. A valve block, comprising:(a) block leak-tightlyjoinable at its bottom face to a receptacle and having top, bottom,front, rear and side faces; (b) an inlet in a first side face of theblock for introducing fluid thereto; (c) an outlet in a second side faceof the block for discharging fluid thereform; (d) a first valve port atthe top face of the block, (e) a second valve port at said top face ofthe block, in spaced relationship to the first valve port; (f) a thirdvalve port in the front face of the block; (g) a first fluid flowpassage joining the inlet and the first valve port; (h) a second fluidflow passage joining the first port and the bottom face of the block;(i) a third fluid flow passage joining the first valve port and thethird valve port; (j) a fourth fluid flow passage joining the thirdvalve port and the second valve port; (k) a fifth fluid flow passagejoining the second valve port and the bottom face of the block, and inspaced relationship to the second fluid flow passage; (l) a sixth flowpassage joining the second valve port and the outlet; the respectivefluid flow passages at each of said respective valve ports beingpositioned relative to one another whereby independently operable valvesdisposed in said valve ports and operable to provide selected open orclosed valve positions provide: (A) when said third valve port valve isclosed and said first and second valve port valves are open, sequentialfluid flow from said inlet through only said first fluid flow passage,first valve port, second fluid flow passage, said receptacle, fifthfluid flow passage, second valve port, sixth fluid flow passage, andsaid outlet; and (B) when said third valve port valve is open and saidfirst and second valve port valves are closed, sequential fluid flowfrom said inlet through only said first fluid flow passage, first valveport, third fluid flow passage, third valve port, fourth fluid flowpassage, second valve port, sixth fluid flow passage, and said outlet.2. A valve block according to claim 1, comprising diaphragm valvesdisposed at each of the said valve ports.
 3. A valve block according toclaim 1, wherein each said valve port comprises a cylindrical bore inthe block, the faces of the block being planar at least in the vicinityof each said bore, and with each said bore having a planar floor withinthe block which is parallel to its associated planar face portionproximal to the bore.
 4. A valve block according to claim 3, wherein thefluid flow passages joined to the respective valve ports are joinedthereto at the planar floors of said valve ports.
 5. A valve blockaccording to claim 4, wherein said second fluid flow passage joins to acentral portion of the floor of said first valve port; said first andthird fluid flow passages are joined to a portion of the floor of saidfirst valve port outwardly spaced from said central portion, and fromeach other; said fifth fluid flow passage joins to a central portion ofthe floor of said second valve port; and said fourth and sixth fluidflow passages are joined to a portion of the floor of said second valveport outwardly spaced from said central portion thereof, and from eachother.
 6. A valve block according to claim 3, wherein the floor plane ofeach said valve port is perpendicular to the central axis of thecylindrical bore of said valve port.
 7. A valve block according to claim1, comprising valves disposed in said valve ports.
 8. A containercomprising a receptacle leak-tightly joined to a valve block accordingto claim
 1. 9. A container according to claim 8, wherein the inlet hasjoined thereto coupling means for connection to a fluid supply conduit,and said outlet has joined thereto coupling means for connection to afluid discharge conduit.
 10. A container according to claim 8, whereinthe receptacle contains a vapor source liquid.
 11. A container accordingto claim 10, wherein said liquid is an organometallic metal sourcereagent liquid.
 12. A container according to claim 8, wherein thereceptacle contains a vapor source liquid in at least one closed,liquid-containing permeable tube of a selected permeability to supplyvapor to gas flowed through said receptacle via the valve block.
 13. Acontainer according to claim 8, comprising a loading port forintroduction of a contacting medium liquid into the receptacle,comprising a loading passage extending through the valve block from thetop face to the bottom face thereof, and communicating with saidreceptacle at said bottom face, and means for leak-tight closure of saidpassage.
 14. A container according to claim 8, comprising joined to saidsecond fluid flow passage at the bottom face of said valve block aconduit extending downwardly into said receptacle to discharge fluidinto the receptacle.
 15. A container according to claim 14, wherein saidconduit has a coiled conformation.
 16. A container according to claim 8,wherein the receptacle contains a sorbent material.
 17. A containeraccording to claim 16, wherein said sorbent material is sorptivelyselective for one or more gaseous contaminants selected from the groupconsisting of Lewis acids and oxidants.
 18. A container according toclaim 16, comprising a loading port for introduction of said sorbentmaterial into the receptacle, comprising a loading passage joined to andcommunicating with said receptacle, and means for leak-tight closure ofsaid passage.
 19. A container according to claim 18, wherein the loadingpassage is joined to the floor of said receptacle.
 20. A method ofdispensing a vapor phase from a liquid using the apparatus as defined inclaim 8, comprising:(a) providing said container, containing saidliquid, and with valves at each of said first, second, and third valveports, in closed position; (b) coupling the inlet of said container to acarrier gas supply means; (c) opening said third valve port valve, toflow carrier gas from said supply means through the first fluid flowpassage, first valve port, third fluid flow passage, third valve port,fourth fluid flow passage, second valve port, fourth fluid flow passage,second valve port, sixth fluid flow passage, and outlet, and dischargingpurgate-containing carrier gas from said outlet; and (d) closing saidthird valve port valve and opening said first and second valve portvalves, to flow carrier gas from said supply means through the inlet,first fluid flow passage, first valve port, second fluid flow passage,the receptacle, the fifth fluid flow passage, second valve port, sixthfluid flow passage, and outlet, and discharging vapor-containing carriergas from said outlet.
 21. A method of purifying a gas of impuritiesusing the apparatus as defined in claim 8, comprising:(a) providing saidcontainer, containing a sorbent material sorptively selective for saidimpurities, and with valves at each of said first, second, and thirdvalve ports, in closed positions; (b) coupling the inlet of saidcontainer to a purge gas supply means; (c) opening said third valve portvalve, to flow purge gas from said supply means through the first fluidflow passage, first valve port, third fluid flow passage, third valveport, fourth fluid flow passage, second valve port, sixth fluid flowpassage, and outlet, and discharging purge gas from said outlet; (d)closing said third valve port valve; (e) uncoupling the inlet of saidcontainer from purge gas supply means; (f) coupling the inlet of saidcontainer to a source of the impurity-containing gas; and (g) openingsaid first and second valve port valves, to flow saidimpurity-containing gas from said supply means through the inlet, firstfluid flow passage, first valve port, second fluid flow passage, thereceptacle, the fifth fluid flow passage, second valve port, sixth fluidflow passage, and outlet, and discharging impurity-depleted gas fromsaid outlet.